Combination stop for catoptric projection arrangement

A projection arrangement configured to image an object field in an object plane onto an image field in an image plane along a ray path, the projection arrangement comprising:

• first, second, and third reflective elements;
• a plurality of combination stops, each of the combination stops having first, second, and third openings;
• a reticle;
• and
• a magazine configured to hold a plurality of combination stops, each combination stop having different sized openings,
• wherein:
• the plurality of combination stops comprises a first combination stop;
• the first combination stop is between the reticle and the first reflective element;
• the first combination stop is between the first reflective element and the second reflective element;
• a first opening in the first combination stop is configured to allow passage of the ray bundle from the first reflective element to the second reflective element;
• a second opening in the first combination stop is configured to allow passage of the ray bundle between the reticle and first reflective element;
• a third opening in the first combination stop is configured to allow passage of the ray bundle from the second reflective element;
• and
• the projection arrangement is a micro lithography projection arrangement.