# US 2012/0235339 A1 · Process equipment architecture

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- Number: US 2012/0235339 A1
- Document ID: US20120235339A1
- Status: Published application
- Kind: A1
- Application number: 13/486,960
- Filed: 2012-06-01
- Published: 2012-09-20
- Earliest claimed: 2008-11-07
- Assignees: Applied Materials, Inc.
- Inventors: Jacob Newman; Dinesh Kanawade; Miriam Schwartz; Nir Merry; Michael Thomas Haag
- Web page: https://patentgrep.com/patent/US20120235339A1

## CPC

- H10P 72/0462: {characterised by the construction of the processing chambers, e.g. modular processing chambers}
- H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10

## Abstract

Embodiments of the present invention relate to improvements to single-substrate, multi-chamber processing platform architecture for minimizing fabrication facility floor space requirements. Prior art systems require significant floor space around all sides to allow for adequate installation and servicing. Embodiments of the present invention provide platforms that allow for servicing the chambers and supporting systems via a front and rear of the platform allowing multiple, side-by-side platform placement within a fabrication facility, while providing improved serviceability of the platform components.

## Claims

### Claim 1

A system for substrate processing equipment, comprising:
a first single-substrate, multi-chamber processing platform having a first side and a second side with a central service corridor having a length extending from the first side of the first platform to the second side of the first platform and a width of at least about 36 inches;
a second single-substrate, multi-chamber processing platform having a first side and a second side with a central service corridor having a length extending from the first side of the second platform to the second side of the second platform and a width of at least about 36 inches;
wherein the second side of the first platform is adjacent the first side of the second platform such that the central service corridor of the first platform is substantially aligned with the central service corridor of the second platform.

### Claim 2 (depends on 1)

The system of claim 1, wherein the first and second platforms each have a first single-substrate processing chamber and a second single-substrate processing chamber adjacent the service corridor and attached to a factory interface unit with an access panel separating the first and second processing chambers.

### Claim 3 (depends on 2)

The system of claim 2, wherein the first and second platforms each have a first power unit disposed adjacent the service corridor opposite the first and second single-substrate processing chambers.

### Claim 4 (depends on 3)

The system of claim 3, wherein the first and second platforms each have a second power unit disposed adjacent the service corridor opposite the first and second single-substrate processing chambers.

### Claim 5 (depends on 4)

The system of claim 4, wherein the first and second platforms each have a rear service corridor separating the first power unit from the second power unit and having a length extending from the rear of the platform and intersecting the central service corridor and a width of at least about 42 inches.

### Claim 6 (depends on 5)

The system of claim 5, wherein the first power unit and the second power unit of each of the first and second platforms each have an access panel disposed adjacent the rear service corridor.

### Claim 7

A system for substrate processing equipment, comprising:
a first substrate processing platform having a first side and a second side with a central service corridor extending from the first side to the second side of the first platform;
a second substrate processing platform having a first side and a second side with a central service corridor extending from the first side to the second side of the second platform, wherein the first side of the second platform is adjacent the second side of the first platform; and
a third substrate processing platform having a first side and a second side with a central service corridor extending from the first side to the second side of the third platform, wherein the second side of the second platform is adjacent the first side of the third platform, and wherein the central service corridor of each of the platforms are substantially aligned.

### Claim 8 (depends on 7)

The system of claim 7, wherein the first, second and third platforms each have a first single-substrate processing chamber and a second single-substrate processing chamber adjacent the central service corridor and attached to a factory interface unit with an access panel separating the first and second single-substrate processing chambers.

### Claim 9 (depends on 8)

The system of claim 8, wherein each of the first, second and third platforms have a first and second power unit disposed adjacent the service corridor opposite the first and second single-substrate processing chambers.

### Claim 10 (depends on 9)

The system of claim 9, wherein the first and second power unit of each of the first, second and third platforms are separated by a rear service corridor extending from the rear of the platform and intersecting the central service corridor.