Electron beam irradiation apparatus and electron beam drawing apparatus

An electron beam drawing apparatus comprising:

• an electron optical lens-barrel which has an objective lens arranged in a part that faces a specimen and which is configured to apply an electron beam onto a specimen surface to form a desired pattern;
• an electron detector which is provided between the objective lens of the electron optical lens-barrel and the specimen surface and which is configured to detect reflected electrons or secondary electrons emitted from the specimen surface;
• an antireflection mechanism which is provided between the electron detector and the specimen surface and which has a plurality of holes following spiral trajectories of reflected electrons or secondary electrons emitted from the specimen surface and is configured to prevent the reflected electrons or secondary electrons from being re-reflected toward the specimen surface and to direct a part of the reflected electrons or secondary electrons to the electron detector.