Annealing apparatus using two wavelengths of continuous wave laser radiation

A thermal treatment apparatus, comprising:

• a stage;
• a source of activating energy;
• a source of heating energy;
• a first optical assembly comprising a reflector disposed along an optical axis of the source of activating energy and having a reflection axis that intersects the stage;
• and
• a second optical assembly comprising a homogenizer and a polarizer disposed along an optical axis of the source of heating energy.

A thermal treatment apparatus, comprising:

• a stage;
• a CO2 laser;
• a plurality of diode lasers;
• a first optical assembly optically coupled to the CO2 laser, the first optical assembly comprising a homogenizer, a polarizer, an anamorphic optic, and a reflector to direct a beam from the CO2 laser to a first area adjacent the stage;
• a second optical assembly optically coupled to the plurality of diode lasers, the second optical assembly comprising a reflector to direct a beam from the plurality of diode lasers to a second area adjacent the stage, wherein the second area surrounds the first area;
• and
• a translation mechanism coupled to the stage or to the first and second optical assemblies.