Device housing and method for making same
AssigneesHon Hai Precision Industry Co., Ltd., HONG FU JIN PRECISION INDUSTRY (ShenZhen) CO., LTD.
InventorsHSIN-PEI CHANG, WEN-RONG CHEN, HUANN-WU CHIANG, CHENG-SHI CHEN, XIAO-QIANG CHEN
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Abstract
A device housing having an aluminum or aluminum alloy substrate, an aluminum layer and a corrosion resistant layer formed on the aluminum or aluminum alloy substrate in that order is provided. The corrosion resistant layer is an Al—C—N gradient layer implanted with iridium ions by ion implantation process. The atomic percentages of N and C in the Al—C—N gradient layer both gradually increase from the area near the aluminum layer to the area away from aluminum or aluminum alloy substrate. Therefore the device housing has a high corrosion resistance. A method for making the device housing is also provided.
Claims14
A device housing, comprising:
- a substrate made of aluminum or aluminum alloy;
- an aluminum layer formed on the substrate;
- a corrosion resistant layer formed on the aluminum layer;
- wherein the corrosion resistant layer is an Al—C—N gradient layer doped with iridium ions, the atomic percentages of N and C in the Al—C—N gradient layer both gradually increase from the area near the aluminum layer to the area away from the aluminum layer.
A method for making a device housing, the method comprising:
- providing a substrate made of aluminum or aluminum alloy;
- forming an aluminum layer on the substrate by vacuum sputtering;
- forming a corrosion resistant layer formed on the aluminum layer, the corrosion resistant layer being an Al—C—N gradient layer doped with iridium ions, the atomic percentages of N and C in the Al—C—N gradient layer both gradually increasing from the area near the aluminum layer to the area away from aluminum layer.
Dependencies are inferred from the claim text.