Microwave plasma deposition device
OwnerI-Nan LIN, Ton-Rong Tsenginventors
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Abstract
A microwave plasma deposition device includes: a main chamber; a support disposed in the main chamber for supporting an article to be coated; a resonance chamber fluidly connected to the main chamber and disposed opposite to the support; a microwave plasma generator disposed in the resonance chamber for generating a plasma to travel to the support; a separation cover unit disposed in the main chamber to cover the support and to define a deposition space within the main chamber and around the support, and including a plurality of plasma through holes that connect fluidly the deposition space with a remaining part of the main chamber to permit the plasma to enter the deposition space; and a precursor supplying device for supplying a precursor to the deposition space.
Claims6
A microwave plasma deposition device, comprising:
- a main chamber;
- a support disposed in said main chamber for supporting an article to be coated;
- a resonance chamber fluidly connected to said main chamber and disposed opposite to said support;
- a microwave plasma generator disposed in said resonance chamber for generating a plasma to travel to said support;
- a separation cover unit disposed in said main chamber to cover said support and to define a deposition space within said main chamber and around said support, and including a plurality of plasma through holes that connect fluidly said deposition space with a remaining part of said main chamber to permit the plasma to enter said deposition space;
- and
- a precursor supplying device for supplying a precursor to said deposition space.
Dependencies are inferred from the claim text.