Microelectromechanical system device including a metal proof mass and a piezoelectric component

An electromechanical gyroscope apparatus comprising:

• a first device configured as a drive component of the electromechanical gyroscope apparatus, the first device including:
• a metal layer;
• a first dielectric layer disposed on the metal layer;
• a first electrode layer disposed on the first dielectric layer;
• a piezoelectric layer disposed on the first electrode layer, the piezoelectric layer configured to respond to an electric field;
• a second electrode layer disposed on the piezoelectric layer, the first electrode layer and the second electrode layer configured to apply an electric field across the piezoelectric layer;
• and
• a second dielectric layer disposed on the second electrode layer.

An apparatus of an electromechanical device, the apparatus comprising:

• a metal layer;
• a first dielectric layer disposed on the metal layer;
• a first electrode layer disposed on the first dielectric layer;
• a first piezoelectric layer disposed on the first electrode layer, the first piezoelectric layer configured to respond to a mechanical force;
• a second electrode layer disposed on the first piezoelectric layer, the first electrode layer and the second electrode layer configured to sense a first electric field generated by the first piezoelectric layer in response to the mechanical force;
• a second piezoelectric layer disposed on the second electrode layer, the second piezoelectric layer configured to respond to the mechanical force;
• a third electrode layer disposed on the second piezoelectric layer, the second electrode layer and the third electrode layer configured to sense a second electric field generated by the second piezoelectric layer in response to the mechanical force, a differential signal capable of being provided by the combination of the sensed first electric field and the sensed second electric field;
• and
• a second dielectric layer disposed on the third electrode layer.

A method comprising:

• forming a sacrificial layer on a substrate;
• forming a first dielectric layer on the sacrificial layer;
• forming a first electrode layer on the first dielectric layer;
• forming a piezoelectric layer on the first electrode layer;
• forming a second electrode layer on the piezoelectric layer;
• forming a second dielectric layer on the second electrode layer;
• and
• forming a metal layer on the second dielectric layer.

An apparatus comprising:

• an electromechanical system device, the electromechanical system device including:
• a first dielectric layer;
• a first electrode layer disposed on the first dielectric layer;
• a piezoelectric layer disposed on the first electrode layer, the piezoelectric layer configured to respond to at least one of an electric field or a mechanical force;
• a second electrode layer disposed on the piezoelectric layer, the first electrode layer and the second electrode layer configured to apply the electric field across the piezoelectric layer or to sense an electric field generated by the piezoelectric layer due to the mechanical force;
• a second dielectric layer disposed on the second electrode layer;
• and
• a metal layer disposed on the second dielectric layer.