Metal Salt-Containing Composition, Substrate, Manufacturing Method of Substrate
AssigneeDai-Ichi Kogyo Seiyaku Co., Ltd.
InventorsYasuteru Saito, Naoki Ike
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AssigneeDai-Ichi Kogyo Seiyaku Co., Ltd.
InventorsYasuteru Saito, Naoki Ike
Estimating the term…
An object of the present invention is to provide a metal salt-containing composition which is applicable to many metal source materials, and can be used for forming a compact and uniform metal oxide film comparable to those formed according to a sputtering method, as well as to provide a substrate having a metal complex film on the surface thereof obtained using the metal salt-containing composition, and a substrate having a metal complex film on the surface thereof obtained by further heating the substrate. Moreover, another object of the present invention is to provide a method for manufacturing a substrate having such a metal complex film on the surface thereof. According to the present invention, a metal salt-containing composition containing a metal salt, a polyvalent carboxylic acid having a cis-form structure, and a solvent, in which: the molar ratio of the polyvalent carboxylic acid to the metal salt is not less than 0.5 and not more than 4.0; the moisture content of the composition is not less than 0.05% by weight is used in an application method to apply on a substrate. Thereafter, a two-step heat treatment is carried out.
A metal salt-containing composition comprising
A substrate having a metal complex film formed on the surface thereof, the metal complex film being obtained by:
A method for manufacturing a substrate having an oxidized metal thin film formed on the surface thereof, the method comprising:
Dependencies are inferred from the claim text.