Multistage process for producing ethylene polymer compositions
AssigneeDow Global Technologies LLC
InventorsPatrick J.C. Schouterden, Ruddy Nicasy, Sarat Munjal, Burkhard E. Wagner, Robert J. Jorgensen
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AssigneeDow Global Technologies LLC
InventorsPatrick J.C. Schouterden, Ruddy Nicasy, Sarat Munjal, Burkhard E. Wagner, Robert J. Jorgensen
Estimating the term…
The present invention relates to a process of producing an ethylene polymer composition in multiple stages, of which the first stage is preferably a slurry polymerization stage, in the presence of a catalyst system, comprising: a) a solid catalyst precursor, comprising a transition metal selected from titanium and vanadium; magnesium; a halide, optionally an electron donor; and a solid particulate material comprising an inorganic oxide, and wherein the median particle diameter, D50, of the solid catalyst precursor, based upon the total volume of solid catalyst precursor, is from 1 to 13 micrometers; and b) an organoaluminium compound.
An ethylene polymer composition, having a density of 0.915-0.970 g/cm3, an MI5 of 0.02-3.5 dg/min, and less than 6 gels per m2 of a size greater than 800 micrometer, and less than 100 gels per m2 of a size in the range from 400 to 800 micrometer, wherein the number and size of gels are determined on a 5 m2 sample of a 50 micrometer thick cast film prepared from the ethylene polymer composition.
An ethylene polymer composition having a density of 0.915-0.970 g/cm3, an melt flow rate (I5) in the rage of from 0.02 to 3.5 g/10 min, wherein the composition has a flexural Young's modulus, as measured on an Instron apparatus according to ISO 178, greater than 1340*{1−exp[−235*(density−0.9451)]}.
An ethylene polymer composition, having a density of 0.915-0.970 g/cm3, an melt flow rate (I5) in the rage of from 0.02-3.5 g/10 min, wherein the composition has a flexural Young's modulus greater than 1355*{1−exp[−235*(density−0.9448)]}.
The composition of claim 6, wherein the composition has a flexural Young's modulus, as measured on an Instron apparatus according to ISO 178, greater than 1340*{1−exp[−235*(density−0.9451)]}.
Dependencies are inferred from the claim text.