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US 2012/0210872 A1Published application
Removal of krypton and xenon impurities from argon by mof adsorbent
AssigneeAmerican Air Liquide, Inc.
InventorsYanyu Duan, Tracey Jacksier
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Abstract
Disclosed is a system and method for removing trace levels of krypton and xenon from argon by using metal organic framework (MOF) adsorbents.
Claims19
A method of removing krypton and/or xenon impurities from an argon gaseous mixture, said method comprising the steps of:
- (a) obtaining an argon gaseous mixture comprising argon and impurities of krypton and/or xenon;
- (b) flowing the mixture through a cartridge containing one or more adsorbents made of a metal organic framework (MOF);
- and
- (c) producing purified argon from the cartridge.
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An argon purification system comprising:
- a source of argon gaseous mixture comprising at least 99% v/v argon and impurities of krypton and/or xenon;
- a cartridge having an inlet and an outlet, the cartridge inlet being in fluid communication with the source, the cartridge containing one or more metal organic framework (MOF) adsorbents, the inlet adapted to receive a mixture containing argon and impurities of krypton and/or xenon, the outlet being adapted to supply purified argon gas;
- and
- an argon consumption device having an inlet in fluid communication with the cartridge outlet.
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Dependencies are inferred from the claim text.