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US 2012/0189525 A1Published application
Contamination Free Compression of Corrosive Gas
AssigneeCirculon Hungary Ltd.
InventorMatthew Sakae Forkin
Life of this patent
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Abstract
A process for the synthesis of a high purity corrosive gas generated by decomposition of a precursor solid at high temperature deploys a dry vacuum pump and a compressor in series so that the corrosive gas is pressured as it fills storage containers.
Claims13
An process for providing pure silicon tetrafluoride (SiF4), the process comprising the steps of:
- a) introducing sodium fluorosilicate (SFS) in a reaction chamber,
- b) providing a first dry vacuum pump having a seal region to evacuate the reaction chamber to less than about 100 torr,
- c) providing a compressor to receive the output of the vacuum pump,
- d) energizing the compressor,
- e) providing SiF4 gas to the seal region of the dry vacuum pump,
- f) heating the SFS to at least 700° C.,
- g) energizing the dry vacuum pump to evacuate the chamber to less than 200 torr,
- h) compressing the pure SiF4 formed in the reaction chamber to at least 300 psi.
5 more elements
A process for obtaining a pure corrosive gas, the process comprising the steps of:
- a) providing a first reaction chamber having at least one outlet port,
- b) providing a first dry vacuum pump in fluid communication with the at least one outlet port to evacuate a corrosive gas from the reaction chamber,
- c) providing a compressor to receive the output of the vacuum pump,
- d) energizing the compressor,
- e) providing a pure form of the corrosive gas to the seals of the dry vacuum pump,
- f) initiating a reaction that produces the corrosive gas in the reaction chamber,
- g) energizing the dry vacuum pump to evacuate the chamber to remove the corrosive gas there from,
- h) compressing the corrosive gas that is received from the dry vacuum pump.
5 more elements
Dependencies are inferred from the claim text.