System and method for low-power nanotube growth using direct resistive heating
AssigneeRaytheon Company
InventorsDELMAR L. BARKER, Mead M. Jordan, William R. Owens
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AssigneeRaytheon Company
InventorsDELMAR L. BARKER, Mead M. Jordan, William R. Owens
Estimating the term…
Direct resistive heating is used to grow nanotubes out of carbon and other materials. A growth-initiated array of nanotubes is provided using a CVD or ion implantation process. These processes use indirect heating to heat the catalysts to initiate growth. Once growth is initiated, an electrical source is connected between the substrate and a plate above the nanotubes to source electrical current through and resistively heat the nanotubes and their catalysts. A material source supplies the heated catalysts with carbon or another material to continue growth of the array of nanotubes. Once direct heating has commenced, the source of indirect heating can be removed or at least reduced. Because direct resistive heating is more efficient than indirect heating the total power consumption is reduced significantly.
An apparatus for growing nanotubes from an element selected from among Carbon, Germanium, Boron, Boron-Nitride, Boron-Carbide, BiCiNk, Silicon and Silicon-Carbide, comprising:
An apparatus for growing, nanotubes from an element selected from among Carbon, Germanium, Boron, Boron-Nitride, Boron-Carbide, BiCjNk, Silicon and Silicon-Carbide, comprising:
A method for low-power growth of nanotubes from an element selected from among Carbon, Germanium, Boron, Boron-Nitride, Boron-Carbide, BiCiNk, Silicon and Silicon-Carbide, comprising:
Dependencies are inferred from the claim text.