Aromatic sulfonium salt compound
AssigneeAdeka Corporation
InventorsYoshie Makabe, Yuta Okuyama
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AssigneeAdeka Corporation
InventorsYoshie Makabe, Yuta Okuyama
Estimating the term…
Disclosed is a photo-acid generator having high developing properties, a cationic polymerization initiator having high curing properties, and a resist composition and a cationically polymerizable composition containing the photo-acid generator and the cationic polymerization initiator, respectively. Specifically, disclosed is an aromatic sulfonium salt compound of general formula (I) and a photo-acid generator, a cationic polymerization initiator, a resist composition, and a cationically polymerizable composition containing the compound. In formula (I), R1 to R19 are each hydrogen, halogen, hydroxyl, optionally hydroxyl-substituted C1-C18 alkyl, optionally hydroxyl-substituted C1-C18 alkoxy, optionally hydroxyl-substituted C1-C18 thioalkoxy, etc.; An− is a monovalent anion; at least one of R1 to R19 is a substituent selected from the group consisting of hydroxyl, hydroxyl-substituted C1-C12 ester group, hydroxyl-substituted C1-C18 alkoxy, and hydroxyl-substituted C1-C18 thioalkoxy.
1-9. (canceled)
An aromatic sulfonium salt compound represented by general formula (I):
Dependencies are inferred from the claim text.