Photocurable resin composition containing fluorine and method for producing a resin mold using same
AssigneeDongjin Semichem Co., Ltd.
InventorsJae-won Yoo, Byung-uk Kim, Un-yong Kim, Eun-jin Kwak
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Abstract
There are provided a fluorine-containing photocurable resin composition and a method of preparing a mold comprising the same and more particularly, a photocurable resin composition having chemical resistance, mechanical properties and high transmittance, etc. as well as being easily wetted with and released from thermosetting or photocurable resins for pattern formation regardless of additional surface treatment, as opposed to the existing polymer resin materials used for resin molds, and a method of preparing a resin mold using the same.
Claims11
A photocurable resin composition wherein it comprises
- a) a reactive pre-polymer prepared by polymerizing i) a reactive fluorine-containing compound having a functional group;
- and
- ii) a reactive silicon-modified urethane compound having a functional group;
- b) at least one compound selected from the group consisting of i) an olefin-type unsaturated compound;
- ii) an unsaturated compound containing an epoxy group;
- and
- iii) a silicon-type compound containing an epoxy group, amine group or fluorine group;
- and
- c) a photo initiator.
Dependencies are inferred from the claim text.