# US 2012/0074615 A1 · Imprint device and microstructure transfer method

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- Number: US 2012/0074615 A1
- Document ID: US20120074615A1
- Status: Published application
- Kind: A1
- Application number: 13/312,189
- Filed: 2011-12-06
- Published: 2012-03-29
- Earliest claimed: 2006-07-07
- Inventors: Takashi Ando; Susumu Komoriya; Masahiko Ogino; Akihiro Miyauchi
- Web page: https://patentgrep.com/patent/US20120074615A1

## CPC

- B29C 43/021: {characterised by the shape of the surface}
- B29C 43/003: {characterised by the choice of material}
- B29C 43/58: Measuring, controlling or regulating {(for bank adjustment in calendering B29C43/245)}
- B82Y 10/00: Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
- B82Y 40/00: Manufacture or treatment of nanostructures
- G03F 7/0002: {Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping}
- B29C 2043/025: {forming a microstructure, i.e. fine patterning}
- B29C 2043/3634: {having specific surface shape, e.g. grooves, projections, corrugations}
- B29C 2043/5808: {pressure or compressing force}
- B29L 2011/0016: {Lenses}
- B29C: SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING (making preforms B29B11/00; making laminated products by combining previously unconnected layers which become one product whose layers will remain together B32B37/00 - B32B41/00)
- B82Y: SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)
- B29L: INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES

## Abstract

There is provided an imprint device for transferring a fine pattern to a material to form a patterned material. The device comprises a stamper having the fine pattern thereon, and a pressure distribution mechanism. The stamper is pressed against the material, and the pressure distribution mechanism provides a nonuniform pressure distribution in a patterned region of the patterned material, while the stamper is in contact with the material. There are provided an imprint device and a microstructure transfer method, by which it is possible to sufficiently spread a resin or other material for forming a pattern layer between a stamper and a patterned material with a lower pressure so as not to damage the stamper or the patterned material, and to form a pattern formation layer having the uniform thickness on the patterned material.

## Claims

### Claim 1

A microstructure transfer method comprising a step of contacting a stamper having a fine pattern thereon with a material, and a step of transferring the fine pattern of the stamper to the material by pressing the stamper against the material, so as to form a patterned material,
in the step of transferring, a nonuniform pressure distribution being provided in a patterned region of the patterned material.

### Claim 2 (depends on 1)

A microstructure transfer method according to claim 1,
wherein the pressure distribution has the highest pressure point in the patterned region.

### Claim 3 (depends on 1)

The microstructure transfer method according to claim 1,
wherein the pressure distribution defines a contour line of the highest pressure point in the patterned region, and the contour line defines a closed region in the patterned region.

### Claim 4 (depends on 1)

The microstructure transfer method according to claim 1,
wherein the pressure distribution changes in the patterned region over time.

### Claim 5 (depends on 1)

The microstructure transfer method according to claim 1 further comprising,
a step of pressing one of a first plate provided on one side of the stamper and a second plate provided on one side of the material against the other.

### Claim 6 (depends on 1)

The microstructure transfer method according to claim 1 further comprising,
a step of applying a material on at least one of surfaces of the material and the stamper so as to form a pattern formation layer having the fine pattern, before the stamper is pressed against the material,
the pattern formation layer being formed by spreading the applied material on the surface of the material when the stamper and the material are in contact with each other.