Substrate processing system, substrate placing position adjusting method and storage medium

A substrate placing position adjusting method which acquires data on a substrate placing position where a substrate carrying means is required to place a substrate on a substrate holding device capable of rotating about a vertical axis and included in a processing unit for processing a substrate substantially horizontally held by the substrate holding device, said substrate placing position adjusting method comprising the steps of:

• transferring a jig from the substrate carrying means to the substrate holding device;
• measuring centrifugal acceleration imparted to a measuring position in the jig when the substrate holding device holding the jig is rotated at a fixed angular velocity;
• calculating an eccentricity of the measuring position from a rotation center of the substrate holding device on the basis of a centrifugal acceleration measured by the measuring means;
• changing the position of the jig on the substrate holding device to determine a position of the rotation center of the substrate holding device on the basis of eccentricities of two different jig placing positions, centrifugal acceleration imparted to a jig placing position other than the two jig placing positions, and the eccentricity of the jig placing position other than the two jig placing positions;
• and
• storing data on a position, the center of a substrate placed at which coincides with the rotation center of the substrate holding device, as data on a substrate placing position.