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AssigneeKuraray Co., Ltd.
InventorsKazuya SHIMIZU, Masayoshi YAMANAKA, Tatsuhiko HAYASHIBARA, Hideharu IWASAKI
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Provided are an acrylate derivative useful as a raw material of a polymer compound for resist compositions capable of giving resist patterns which are excellent in lithographic performance and have a good shape, an intermediate thereof (alcohol derivative) and production processes for them. To be specific, it is an acrylate derivative represented by a formula shown below: (wherein R1 represents a hydrogen atom, methyl or trifluoromethyl; R2, R3, R5, R7, R8, R9 and R10 each represent independently a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, a cycloalkyl group having 3 to 6 carbon atoms or an alkoxy group having 1 to 6 carbon atoms; R4 and R6 each represent independently a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, a cycloalkyl group having 3 to 6 carbon atoms or an alkoxy group having 1 to 6 carbon atoms, or both of R4 and R6 are combined to represent an alkylene group having 1 to 3 carbon atoms, —O— or —S—; and R11 represents a hydrogen atom, an alkyl group having 1 to 6 carbon atoms or a cyclic hydrocarbon group having 3 to 10 carbon atoms).
An acrylate derivative represented by Formula (1) shown below:
A production process for an acrylate derivative represented by Formula (1) shown below:
An alcohol derivative represented by Formula (2) shown below:
A production process for an alcohol derivative represented by Formula (2) shown below:
(canceled)
A production process for an acrylate derivative represented by Formula (1) shown below:
Dependencies are inferred from the claim text.