Base generator, photosensitive resin composition, pattern forming material comprising the photosensitive resin composition, pattern forming method using the photosensitive resin composition and products comprising the same

A base generator which is represented by the following chemical formula (1) and generates a base by exposure to electromagnetic radiation and heating:

• wherein R1 and R2 are each independently a hydrogen or an organic group and may be the same or different;
• R1 and R2 may be bound to form a cyclic structure which may contain a heteroatom;
• at least one of R1 and R2 is an organic group;
• R3 and R4 are each independently a hydrogen, a halogen, a hydroxyl group, a mercapto group, a sulfide group, a silyl group, a silanol group, a nitro group, a nitroso group, a sulfino group, a sulfo group, a sulfonato group, a phosphino group, a phosphinyl group, a phosphono group, a phosphonato group or an organic group and may be the same or different;
• R5, R6, R7 and R8 are each independently a hydrogen, a halogen, a hydroxyl group, a mercapto group, a sulfide group, a silyl group, a silanol group, a nitro group, a nitroso group, a sulfino group, a sulfo group, a sulfonato group, a phosphino group, a phosphinyl group, a phosphono group, a phosphonato group, an amino group, an ammonio group or an organic group and may be the same or different;
• two or more of R5, R6, R7 and R8 may be bound to form a cyclic structure which may contain a heteroatom;
• and R9 is a protecting group which can be deprotected by heating and/or exposure to electromagnetic radiation.