Resin, resist composition and method for producing resist pattern

A resin having a structural unit derived from a compound represented by the formula (I).

• wherein R1 represents a C1 to C6 alkyl group that optionally has a halogen atom, a hydrogen atom or a halogen atom;
• A1 represents an optionally substituted C1 to C6 alkanediyl group or a group represented by the formula (a-1);
• wherein s represents an integer of 0 to 2;
• A10 and A11 in each occurrence independently represent an optionally substituted C1 to C5 aliphatic hydrocarbon group;
• A12 represents an optionally substituted C1 to C5 aliphatic hydrocarbon group or a single bond;
• X10 and X11 in each occurrence independently represents an oxygen atom, a carbonyl group, a carbonyloxy group or an oxycarbonyl group;
• provided that a total number of the carbon atom of A10, A11, A12, X10 and X11 is 12 or less;
• ring X1 represents a C2 to C36 heterocyclic ring, a hydrogen atom contained in the heterocyclic ring may be substituted with a halogen atom, a hydroxy group, a C1 to C24 hydrocarbon group, a C1 to C12 alkoxy group, a C2 to C4 acyl group or a C2 to C4 acyloxy group.