Set of masks, method of generating mask data and method for forming a pattern
AssigneeKabushiki Kaisha Toshiba
InventorsSatoshi Tanaka, Koji Hashimoto
Life of this patent
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Abstract
A method of generating mask data, for a set of masks used to transfer a pattern for delineating a circuit pattern of a semiconductor integrated circuit, includes preparing design data having a design pattern corresponding to the pattern to be transferred on a semiconductor substrate; generating resized data by enlarging the design data by a resizing quantity; generating first mask data by filling a space area having a space width of a space quantity or less of the resized data; and generating second mask data, to be aligned with the first mask data, having a window portion for selectively exposing an area determined by enlarging the space area by the resizing quantity.
Claims3
-19. (canceled)
A set of masks for forming a thin line portion having a line width thinner than a minimum line width which can be optically resolved by a projection exposure system by slimming a line width of a pattern transferred on a semiconductor substrate, the set of masks comprising:
- a first mask having a thin line pattern for forming the thin line portion;
- and
- a second mask having a window portion for removing an unnecessary portion having a minimum space width with which a pattern can be optically resolved by the projection exposure system, from a pattern including the thin line portion on the semiconductor substrate transferred by the first mask.
Dependencies are inferred from the claim text.