Method for nanopatterning based on self assembly of a triblock terpolymer
AssigneeMassachusetts Institute of Technology
InventorsPeng-Wei Chuang, Caroline A. Ross, Edwin L. Thomas
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Abstract
Nanolithography and nanoscale device features based on a self-assembled film comprising an ABC triblock terpolymer disposed on a substrate surface are provided. The self-assembled film has a controlled pattern of features over the entire film. Each feature comprises block A, block B, or block C of the ABC triblock terpolymer. One or more blocks (A, B, or C) of the self-assembled film can be transformed by, for example, being removed, to provide a particular pattern geometry for nanolithography.
Claims25
A self-assembled film comprising an ABC triblock terpolymer disposed on a substrate surface and having a controlled pattern of features over the entire film.
A method for triblock terpolymer lithography comprising:
- providing an ABC triblock terpolymer comprising material;
- providing a substrate having a surface;
- depositing the ABC triblock terpolymer comprising material as a film on the substrate surface, wherein the film has a thickness of about 50 nm or less;
- structuring the film into a self-assembled pattern of features, wherein a feature comprises a microdomain of block A, block B, or block C of the ABC triblock terpolymer;
- and
- transforming at least one of the block A, block B, or block C comprising features of the film situated on at least a portion of the substrate.
Dependencies are inferred from the claim text.