Method for collection of hexachlorodisilane and plant for the method
AssigneeDenki Kagaku Kogyo Kabushiki Kaisha
InventorsYasufumi Matsuo, Kouichi Takemura, Shin Sugimura
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Abstract
Disclosed is a method for collecting hexachlorodisilane which is produced as a by-product in the production of trichlorosilane from tetrachlorosilane and hydrogen. The method has the steps of: reacting a source gas composed of vaporized trichlorosilane and hydrogen at a temperature ranging from 700 to 1400° C. to yield a reaction product gas; cooling the reaction product gas to a temperature ranging from 30 to 60° C. to yield a cooled condensate liquid containing hexachlorodisilane; and concentrating and collecting a high boiling material containing hexachlorodisilane from the cooled condensate liquid.
Claims15
A method for collecting hexachlorodisilane, comprising the steps of:
- reacting a source gas containing vaporized tetrachlorosilane and hydrogen at a temperature ranging from 700 to 1400° C. to obtain a reaction product gas;
- cooling the reaction product gas to a temperature range of 30 to 60° C. to obtain a cooled condensate liquid containing hexachlorodisilane;
- and
- concentrating and collecting a high boiling material containing hexachlorodisilane from the cooled condensate liquid.
A plant for collecting hexachlorodisilane, comprising:
- a reactor for reacting a source gas containing vaporized tetrachlorosilane and hydrogen at a temperature ranging from 700 to 1400° C. to obtain a reaction product gas,
- a quenching tower for cooling the reaction product gas to a temperature range of 30 to 60° C. to obtain a cooled condensate liquid containing hexachlorodisilane, and
- a concentrating column for concentrating and collecting a high boiling material containing hexachlorodisilane from the cooled condensate liquid.
Dependencies are inferred from the claim text.