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US 2012/0070136 A1Published application
Transparent Reflector Plate For Rapid Thermal Processing Chamber
AssigneeApplied Materials, Inc.
InventorsBlake R. Koelmel, Aaron M. Hunter, Alexander N. Lerner
Life of this patent
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Abstract
The present invention generally relates to methods and apparatus for processing substrates. Embodiments of the invention include apparatuses for processing a substrate comprising a ceramic reflector plate, which may be optically transparent. The reflector plate may include a reflective coating and be part of a reflector plate assembly in which the reflector plate is assembled to a baseplate.
Claims20
An apparatus for processing a substrate having a front side and a back side, the apparatus comprising:
- a process area within a chamber defined on one side by a window adjacent a radiant heat source located outside the process area;
- and
- a reflector plate disposed opposite the radiant heat source, the reflector plate comprising a body made from a ceramic material and a reflective coating on a side of the reflector plate, and a plurality of apertures extending through at least the reflective coating.
A reflector plate assembly apparatus for a rapid thermal processing chamber comprising:
- a baseplate having a plurality of openings therethrough to accommodate a pyrometer probe;
- and
- a reflector plate comprising a body made from ceramic material and a reflective coating on a side of the reflector plate, and a plurality of apertures extending through at least the reflective coating aligned with the openings through the baseplate, wherein the reflector plate is assembled to the baseplate such that the openings in the baseplate and the apertures in the reflector plate are aligned.
Dependencies are inferred from the claim text.