Back to results
US 2012/0069949 A1Published application
Method of and system for suppressing deposition of radioactive substance
AssigneeKabushiki Kaisha Toshiba
InventorsYumi Yaita, Teruki Fukumatsu, Hiromi Aoi, Yutaka Uruma
Life of this patent
Estimating the term…
Abstract
A radioactive substance is effectively suppressed by an oxide-film removal step of removing an oxide film on a metallic material surface with which a coolant containing the radioactive substance comes in contact, and a titanium-oxide deposition step of depositing a titanium oxide on the metallic material surface after the oxide film has been removed.
Claims10
A method of suppressing deposition of a radioactive substance comprising the steps of:
- removing an oxide film on a metallic material surface with which a coolant containing the radioactive substance comes in contact;
- and
- depositing a titanium oxide on the metallic material surface after the removal of the oxide film.
A system for suppressing redeposition of a radioactive substance comprising:
- an oxide-film removal apparatus for removing an oxide film on a metallic material surface with which a coolant containing the radioactive substance comes in contact;
- and
- a titanium-oxide deposition apparatus for depositing a titanium oxide on the metallic material surface after the removal of the oxide film.
Dependencies are inferred from the claim text.