Method and system for raman, fluorescence, lithographic, stimulated emission and photochemical imaging beyond the diffraction limit
OwnerRobert D. Frankelinventor
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OwnerRobert D. Frankelinventor
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Systems and methods for hyper-resolution beyond the diffraction limit of optical microscopes for applications in spectroscopy, absorption and lithographic photochemical patterning are described. These systems are based on interference of a pump pulse and a Stokes laser pulse which interfere to localize the population of an excited vibrational state in an area that is smaller than the scanning resolution of the microscope. Another (interfering) Stokes pulse has an annular shape at focus and destructively interferes with the the Stokes laser pulse. This destructive interference causes narrowing of the population distribution of the vibrational excited state well below the diffraction limit, which in turn localizes the population of the central electronic excited state by a separate actinic laser pulse having a lower energy than the ground state excitation energy of the molecule. A stepped photolithography system uses two photomasks to produce photoresist images capable of printing features smaller than 10 nm.
A laser system for analyzing or exposing a sample to optical radiation, the system comprising:
A method for stimulated fluorescence, absorption, fluorescence or Raman microscopy having resolution exceeding a diffraction limit, comprising the steps of:
A method for exposing photoresist with a spatial resolution exceeding a diffraction limit, comprising the steps of:
The method of claim 19, wherein the first optical projection mask is displaceable relative to the second optical projection mask.
Dependencies are inferred from the claim text.