Semiconductor microlithography projection exposure apparatus
AssigneeCarl Zeiss SMT GmbH
InventorsSascha Bleidistel, Olaf Conradi, Arif Kazi
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Abstract
The disclosure relates to an optical correction arrangement including at least one optical element and at least one irradiation mechanism for the targeted local irradiation of the optical element with electromagnetic heating radiation for the targeted local heating of the optical element. The optical correction arrangement also includes a mechanism for dissipating the thermal energy introduced into the optical element by the at least one irradiation mechanism. The disclosure furthermore relates to a projection exposure apparatus for semiconductor lithography including an optical correction arrangement according to the disclosure.
Claims23
An apparatus, comprising:
- a first optical element;
- a first mechanism configured to heat the first optical element by irradiating the first optical element with heating radiation;
- and
- a second mechanism configured to flow a fluid along a surface of the first optical element to dissipate heat from the first optical element,
- wherein the apparatus is a semiconductor microlithography projection exposure apparatus.
Dependencies are inferred from the claim text.