Method for Manufacturing a Piezoelectric Device and the Same
AssigneeNihon Dempa Kogyo Co., Ltd.
InventorsRyoichi Ichikawa, Yoshiaki Amano, Kenji Kamezawa
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AssigneeNihon Dempa Kogyo Co., Ltd.
InventorsRyoichi Ichikawa, Yoshiaki Amano, Kenji Kamezawa
Estimating the term…
The present disclosure provides a method for manufacturing piezoelectric devices by using a base wafer having through-holes manufactured in precise size. In the method for manufacturing a piezoelectric device comprises: a step of: forming an anticorrosive film (S121) on a first surface and on a second surface opposing the first surface of the base wafer made of a glass or a piezoelectric material; after forming a photoresist on the anticorrosive film and exposing, metal-etching the anticorrosive film (S121, S122) corresponding to the through-hole; after the metal-etching step, applying an etching solution onto the glass or the piezoelectric material and wet-etching (S123) the first surface and the second surface of the base wafer until before completely cutting through the glass or the piezoelectric material; and applying an abrasive from the second surface with the anticorrosive film remaining in place on the second surface, by sand-blasting method (S124).
A method for manufacturing a piezoelectric device having a piezoelectric vibrating piece and a package base, the method comprising the steps of:
A piezoelectric device including a piezoelectric vibrating piece disposed inside a cavity formed by a package lid and a package base, wherein:
Dependencies are inferred from the claim text.