Liquid Crystal Display Device and Method for Manufacturing the Same

A method for manufacturing a liquid crystal display device with a built-in touch screen, which uses a common electrode as a touch-sensing electrode, comprising the steps of:

• forming a pixel region defined by an intersection of a gate line and a data line;
• forming a gate metal disposed in a central portion of the pixel;
• forming an insulating layer on the gate metal, a first contact hole disposed through the insulating layer to expose a predetermined portion of an upper surface of the gate metal;
• forming a contact metal on the insulating layer and inside the first contact hole, the contact metal electrically connected with the gate metal;
• forming a first passivation layer on the contact metal, a second contact hole disposed through the first passivation layer to expose a predetermined portion of an upper surface of the contact metal;
• forming a common electrode on the first passivation layer and inside the second contact hole;
• forming a conductive line electrically connected with the common electrode;
• and
• forming a second passivation layer on the first passivation layer and the conductive line,
• wherein the gate metal and the common electrode are electrically connected via the contact metal.

A method for manufacturing a liquid crystal display device with a built-in touch screen comprising:

• forming a first contact hole by etching a predetermined portion of an insulating layer on a gate metal, wherein the first contact hole exposes a predetermined portion of an upper surface of the gate metal;
• forming a contact metal on the insulating layer and inside the first contact hole, wherein the contact metal is electrically connected with the gate metal;
• forming a first passivation layer on the contact metal, and forming a second contact hole by etching a predetermined portion of the first passivation layer, wherein the second contact hole exposes a predetermined portion of an upper surface of the contact metal;
• forming a common electrode on the first passivation layer and inside the second contact hole;
• forming a conductive line inside the second contact hole, wherein the conductive line is electrically connected with the common electrode;
• and
• forming a second passivation layer on the first passivation layer and the conductive line,
• wherein the gate metal and the common electrode are electrically connected with each other via the contact metal.