Charged particle beam writing apparatus and charged particle beam writing method

A charged particle beam writing apparatus comprising:

• a total charge amount calculation unit configured to calculate a total charge amount of charged particle beams irradiating each minimum deflection region in deflection regions having different deflection sizes respectively deflected by deflectors of a plurality of levels for deflecting charged particle beams;
• a representative temperature calculation unit configured to calculate a representative temperature of the each minimum deflection region based on heat transfer from other minimum deflection regions having been written before the each minimum deflection region is written;
• a dose modulation unit configured to input a first dose of a shot of each charged particle beam irradiating the each minimum deflection region, and to modulate the first dose by using the representative temperature of the each minimum deflection region;
• and
• a writing unit configured to include the deflectors of a plurality of levels and to write a pattern in the each minimum deflection region with a second dose, which has been modulated, by using the deflectors of a plurality of levels.