Pattern defect inspection apparatus and pattern defect inspection method

A pattern defect inspection apparatus comprising:

• an electron beam irradiation point track data generating unit configured to generate electron beam irradiation point track data for control over scanning with the electron beam on the basis of first data regarding an inspection target pattern, the electron beam irradiation point track data comprising data on a track of points of irradiation of an electron beam to the inspection target pattern;
• an electron beam irradiation unit configured to irradiate the electron beam to the inspection target pattern in accordance with the electron beam irradiation point track data;
• a secondary electron detection unit configured to detect secondary electrons generated from the inspection target pattern due to the irradiation of the electron beam;
• a signal intensity acquisition unit configured to acquire second data on a signal intensity of the secondary electrons from an output signal from the secondary electron detection unit;
• and
• a defect detection unit configured to detect an abnormal point from the second data and outputs the abnormal point as a defect of the inspection target pattern.