Apparatus and method for wet processing substrate
AssigneeFoxconn Advanced Technology Inc.
InventorChao-Wen LIN
Life of this patent
Estimating the term…
Abstract
An exemplary wet processing apparatus includes a tank, a conveyor configured for conveying a substrate, and a spraying system. The tank receives a wet processing liquid. The conveyor includes a first conveying portion, a second conveying portion, and a third conveying portion. The first conveying portion is in the tank and conveys the substrate in the wet processing liquid. The second conveying portion is obliquely interconnected between the first and third conveying portions. The third conveying portion conveys the substrate above the wet processing liquid in the tank. The spraying system is above the third conveying portion, sprays the wet processing liquid onto the substrate on the third conveying portion.
Claims16
A wet processing apparatus, comprising:
- a tank configured for receiving a wet processing liquid;
- a conveyor configured for conveying a substrate, the conveyor comprising a first conveying portion, a second conveying portion adjacent to the first conveying portion, and a third conveying portion adjacent to the second conveying portion, the first conveying portion arranged in the tank and configured for conveying the substrate in the wet processing liquid, the second conveying portion obliquely interconnected between the first and third conveying portions, the third conveying portion configured for conveying the substrate above the wet processing liquid surface in the tank;
- and
- a spraying system arranged over the third conveying portion, the spraying system configured for spraying the wet processing liquid onto the substrate on the third conveying portion.
Dependencies are inferred from the claim text.