Apparatus
AssigneeBeneq Oy
InventorsPekka Soininen, Jarmo Skarp
Life of this patent
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Abstract
An apparatus for carrying out atomic layer deposition onto a surface of a substrate by exposing the surface of the substrate to alternate starting material surface reactions, the apparatus including two or more low-pressure chambers, two or more separate reaction chambers arranged to be placed inside the low-pressure chambers, and at least one starting material feed system common to two or more low-pressure chambers for carrying out atomic layer deposition. The apparatus includes at least one loading device arranged to load and unload substrates to/from the reaction chamber and further to load and unload the reaction chambers to/from the low-pressure chambers.
Claims20
An apparatus for carrying out atomic layer deposition onto a surface of a substrate by exposing the surface of the substrate to alternate starting material surface reactions, the apparatus comprising two or more low-pressure chambers, two or more separate movable reaction chambers arranged to be placed inside the low-pressure chambers, at least one starting material feed system common to two or more low-pressure chambers, and least one loading device arranged to load and unload substrates to/from the movable reaction chamber and further to load and unload the movable reaction chambers to/from the low-pressure chambers.
Dependencies are inferred from the claim text.