Film forming apparatus, wafer holder, and film forming method

A film forming apparatus comprising:

• a boat holding a plurality of wafers;
• a reaction gas supply part supplying a reaction gas from a side surface of the plurality of wafers held by the boat;
• and
• an upper wafer holder being placed to cover an upper surface of each of the plurality of wafers when the plurality of wafer is supported by the boat and including a gas introduction suppression part suppressing an introduction of the reaction gas onto the upper surface of each of the plurality of wafers by surrounding each of the plurality of wafers.

A film forming method comprising:

• placing an upper wafer holder to cover an upper surface of a wafer, the upper wafer holder having a gas introduction suppression part suppressing an introduction of a reaction gas onto an upper surface of a wafer by surrounding the wafer;
• transferring the wafer and the upper wafer holder to a boat with the upper wafer holder placed on the wafer;
• loading the boat into a reaction chamber;
• and
• supplying the reaction gas into the reaction chamber to form a film on a lower surface of the wafer.