Plasma processing apparatus and method thereof
AssigneePanasonic Corporation
InventorsTomohiro OKUMURA, Ichiro NAKAYAMA, Hiroshi KAWAURA, Tetsuya YUKIMOTO
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Abstract
In a plasma torch unit, copper rods forming a coil as a whole are disposed inside copper rod inserting holes formed in a quartz block so that the quartz block is cooled by water flowing inside the copper rod inserting holes and cooling water pipes. A plasma ejection port is formed on the lowermost portion of the torch unit. While a gas is being supplied into a space inside an elongated chamber, high-frequency power is supplied to the copper rods to generate plasma in the space inside the elongated chamber so that the plasma is applied to a substrate.
Claims16
A plasma processing apparatus comprising:
- a case having a chamber that communicates with an opening having a slit shape, and is surrounded by a dielectric member;
- a gas supply device for supplying a gas to the chamber through a gas introducing port;
- a conductive unit that is disposed in a manner so as to bridge over the chamber in the case and generates a high-frequency electromagnetic field in the chamber;
- a high-frequency power supply that supplies high-frequency power to the conductive unit;
- and
- a substrate mounting base on which a substrate is mounted, and which is disposed so as to face the opening,
- wherein a longitudinal direction of the chamber and a longitudinal direction of the opening are disposed in parallel with each other, and
- the conductive unit is formed by electrically connecting a plurality of conductor members that are disposed in parallel with the longitudinal direction of the chamber, with the chamber being sandwiched therebetween.
A plasma processing method comprising:
- supplying a gas through a gas introducing port into a chamber that is installed in a case, and surrounded by a dielectric member, ejecting the gas from a slit-shaped opening toward a substrate, the slit-shaped opening being formed in the chamber and having the longitudinal direction thereof in parallel with the longitudinal direction of the chamber, and supplying high-frequency power to a conductive unit that is electrically connected to a plurality of conductor members that are installed in the case, and disposed in parallel with the longitudinal direction of the chamber with the chamber interposed therebetween, in a manner so as to bridge over the chamber, to generate a high-frequency electromagnetic field in the chamber so that plasma is generated in the chamber supplied with the gas;
- and
- processing a surface of the substrate, while shifting the chamber and the substrate in a direction perpendicular to the longitudinal direction of the opening, relative to each other.
Dependencies are inferred from the claim text.