Resist composition, method of forming resist pattern, novel compound, and acid generator
AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorsYoshiyuki Utsumi, Takehiro Seshimo
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Abstract
A positive resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under the action of acid and an acid-generator component (B) which generates acid upon exposure, wherein the acid-generator component (B) includes an acid generator (B1) containing a compound represented by general formula (b1-1) shown below (wherein Z+ represents an organic cation).
Claims9
A resist composition, comprising a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid, and an acid-generator component (B) which generates acid upon exposure, wherein
- the acid-generator component (B) comprises an acid generator (B1) containing a compound represented by general formula (b1-1) shown below:
- wherein Z+ represents an organic cation.
A compound represented by general formula (b1-1) shown below:
- wherein Z+ represents an organic cation.
Dependencies are inferred from the claim text.