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US 2012/0058270 A1Published application
Thermally stable volatile film precursors
AssigneeWayne State University
InventorsCharles H. Winter, Thomas Joseph Knisley, Panditha Koralalage Don Mahesh Chinthaka Karunarathne
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Abstract
A precursor for the deposition of a thin film by atomic layer deposition is provided. The compound has the formula MxLy where M is a metal and L is an amidrazone-derived ligand or an amidate-derived ligand. A process of forming a thin film using the precursors is also provided.
Claims18
A compound having formula 1:
- MxLy 1
- wherein
- M is a transition metal;
- x is 1 or 2;
- y is an integer from 1 to 4;
- L is N(R1R2)—N═C(R3)—O or OC(R4)—N(R5);
- R1, R2, R3, R4, R5 are each independently hydrogen, C1-12 alkyl or C6-12 aryl, Si(R6)3, or Ge(R6)3;
- and
- R6 is hydrogen, C1-12 alkyl or C6-12 aryl.
6 more elements
A method for depositing a thin film on a surface of a substrate, the method having a deposition cycle comprising:
- contacting the substrate with a vapor of a metal-containing compound having formula I:
- MxLy I
- wherein
- M is a metal;
- x is 1 or 2;
- y is 2 when x is 1 and 4 when x is 2;
- L is N(R1R2)—N═C(R3)—O or OC(R4)—N(R5);
- and
- R1, R2, R3, R4, R5 are each independently hydrogen, C1-12 alkyl or C6-12 aryl;
- such that at least a portion of the vapor of the compound having formula 1 adsorbs or reacts with a substrate surface to form a modified surface;
- and
- contacting the modified surface with a vapor of an activating compound, the activating compound causing the metal-containing compound to react and form at least a portion of the thin film on the surface of the substrate.
9 more elements
Dependencies are inferred from the claim text.