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US 2012/0058258 A1Published application
Methods of cleaning hard drive disk substrates for nanoimprint lithography
AssigneeMolecular Imprints, Inc.
InventorsZhengmao Ye, Rick Ramos
Life of this patent
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Abstract
Post sputter cleaning of hard disk substrates for use in an imprint lithography processes. The cleaning removes contaminants including organic contaminants that otherwise may cause repeating void (non-fill) defects in the imprinted pattern.
Claims20
A method for cleaning the surface of a hard disk drive substrate, the method comprising the steps of:
- providing a hard disk drive substrate;
- pre-soaking the substrate in a first cleaning solution;
- brushing the substrate in a second cleaning solution;
- and
- soaking the substrate in the second cleaning solution with sonication.
2 more elements
A method for cleaning the surface of a hard disk drive substrate, the method comprising the steps of:
- providing a hard disk drive substrate;
- soaking the substrate in deionized water;
- brushing the substrate in a cleaning solution comprising ammonium hydroxide, hydrogen peroxide and water;
- soaking the substrate in the cleaning solution with sonication;
- rinsing the substrate in deionized water;
- and
- drying the substrate under heated nitrogen.
4 more elements
A method for reducing void defects in a patterned layer imprinted on a hard disk drive substrate, the method comprising the steps of:
- providing a hard disk drive substrate;
- soaking the substrate in deionized water;
- brushing the substrate in a cleaning solution comprising ammonium hydroxide, hydrogen peroxide and water;
- soaking the substrate in the cleaning solution with sonication;
- rinsing the substrate in deionized water;
- drying the substrate;
- dispensing a polymerizable material on the substrate;
- contacting the polymerizable material with a template having a patterning surface;
- solidifying the polymerizable material to form the patterned layer.
6 more elements
Dependencies are inferred from the claim text.