Gas generator and gas generation method
AssigneeFujitsu Limited
InventorsJohn David Baniecki, Masatoshi Ishii, Kazuaki Kurihara, Kazunori Yamanaka
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Abstract
A gas generator includes a processing vessel defining a processing space and holding a support body therein, an evacuation system evacuating the processing space; a metal oxide film of a perovskite structure containing oxygen defects formed on the support body, a source gas supplying port supplying a source gas containing molecules of a source compound of carbon dioxide or water into the processing space, a gas outlet port for extracting a product gas containing molecules of a product compound in which oxygen atoms are removed from said source compound, and a heating part heating the support body.
Claims20
A gas generator comprising:
- a processing vessel defining a processing space therein and holding a support body in said processing vessel;
- an evacuation system coupled to said processing vessel and evacuating said processing space;
- a metal oxide film of a perovskite structure formed on said support body, said metal oxide film containing oxygen defects;
- a source gas supplying port configured to supply a source gas containing molecules of a source compound of carbon dioxide or water into said processing space;
- a gas outlet port configured to extract a product gas containing molecules of a product compound in which oxygen atoms are removed from said source compound;
- and
- a heating part configured to heat said support body.
A gas generation method using a gas generator, said gas generator comprising:
- a processing vessel defining a processing space and holding a support body in said processing space;
- a metal oxide film of a perovskite structure containing oxygen defects formed on said support body;
- a source gas supplying port provided to said processing vessel and configured to supply a source gas containing molecules of a source compound into said processing space from an outside of said processing vessel;
- and a gas outlet port provided to said processing vessel and configured to take out a product gas containing molecules of a product compound in which oxygen atoms are removed from said source compound;
- and a heating part configured to heat said support body, said method comprising:
- (A) evacuating said processing space;
- (B) introducing said source gas into said processing space via said source gas supplying port and causing said source compound to dissociate to said product compound by said metal oxide film;
- (C) taking out said product gas from said processing space to an outside of said processing vessel via said gas outlet port;
- and
- (D) causing, after said (A)-(C), said metal oxide film to release oxygen by heating said substrate.
Dependencies are inferred from the claim text.