Method for catalytic treating perfluorocompound gas including particle removing unit
AssigneeIndustrial Technology Research Institute
InventorsSheng-Jen YU, Shou-Nan LI, Shao-I YEN, Tzu-Ming CHEN
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Abstract
The present invention relates to a method for treating fluoro-containing and silicon-containing gas. The method comprises treating the gas with thermal-treating, particles-treating, catalyst-treating, and acid-removing sequentially to remove perfluorocompounds. The invention achieves results of reducing the working temperature, increasing the lifetime of the catalyst, reducing the operating cost of the system, and increasing the applications of the catalyst in the aspect of fluoride-containing gas, silicon-containing gas and particles containing gas treatment by sequential treating.
Claims8
A method for catalytically treating a gas containing silicon hydride at a concentration of 1,000 ppmv˜100,000 ppmv and perfluorocompounds, including a particle removing unit, comprising the steps of:
- (a) thermal-treating both fluoro-containing and silicon hydride (SiH4)— containing gas;
- (b) particle-treating the gas after said thermal-treating to remove particles large than 1 nm in the gas by using a wet electrostatic precipitator with condensation-growth chamber;
- (c) catalyst-treating the gas after the particle-treating in step (b) by contacting with catalyst;
- and
- (d) removing acids after the catalytically treated gas;
- wherein above steps are carried out in 350 to 800° C.
Dependencies are inferred from the claim text.