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US 2012/0056355 A1Published application
Process and apparatus for ultraviolet nano-imprint lithography
AssigneeSamsung Electronics Co., Ltd.
InventorsEun-Hyoung CHO, Sung Hoon CHOA, Jin Seung SOHN, Byung Kyu LEE, Du Hyun LEE
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Abstract
A process and an apparatus for performing a UV nano-imprint lithography are provided. The process uses a polymer pad which allows a uniform application of pressure to a patterned template and an easy removal of a residual resin layer. The apparatus includes a tilt and decentering corrector which allows an accurate alignment of layers during the nano-imprint lithography process.
Claims9
A process of nano-imprint lithography, comprising:
- (a) spin-coating a polymerizable resin on a substrate to form a resin layer on the substrate;
- (b) providing a mold which has a template on the resin layer;
- (c) providing a polydimethylsiloxane (PDMS) pad on the mold;
- (d) applying pressure on top of the PDMS pad using a transparent shaft;
- (e) radiating UV light through the transparent shaft while applying the pressure to produce a cured resin layer which has a replica pattern, the replica pattern is a replica of the template pattern;
- (f) separating the mold from the cured resin layer;
- and
- (g) removing a residual layer from the substrate.
5 more elements
Dependencies are inferred from the claim text.