Semiconductor device
AssigneeSumitomo Electric Industries, Ltd.
InventorsKazuhiro Fujikawa, Shin Harada, Taro Nishiguchi, Makoto Sasaki, Yasuo Namikawa, Shinsuke Fujiwara
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AssigneeSumitomo Electric Industries, Ltd.
InventorsKazuhiro Fujikawa, Shin Harada, Taro Nishiguchi, Makoto Sasaki, Yasuo Namikawa, Shinsuke Fujiwara
Estimating the term…
A JFET, which is a semiconductor device allowing for reduced manufacturing cost, includes: a silicon carbide substrate; an active layer made of single-crystal silicon carbide and disposed on one main surface of the silicon carbide substrate; a source electrode disposed on the active layer; and a drain electrode formed on the active layer and separated from the source electrode. The silicon carbide substrate includes: a base layer made of single-crystal silicon carbide, and a SiC layer made of single-crystal silicon carbide and disposed on the base layer. The SiC layer has a defect density smaller than that of the base layer.
A semiconductor device comprising:
Dependencies are inferred from the claim text.