Method of fabricating semiconductor light emitting device and semiconductor light emitting device

A method of fabricating semiconductor light emitting device, comprising:

• forming a laminated film by laminating an n-type nitride semiconductor layer, an active layer comprising a multiple quantum well structure of nitride semiconductors and a p-type nitride semiconductor layer in order on a uneven main surface of a first substrate;
• forming a plurality of first electrodes corresponding to a plurality of light emitting devices, respectively, on an upper surface of the p-type nitride semiconductor layer;
• forming a first metal layer to cover surfaces of the plurality of first electrodes and the p-type nitride semiconductor layer;
• forming a second metal layer on an upper surface of a second substrate, the second metal layer being made of a material comprising a melting point lower than the melting point of the first metal layer;
• joining the first and second metal layers by facing the first and second substrates;
• cutting the first substrate or forming a groove on the first substrate along a border of the light emitting element from a surface side opposite to the first metal layer on the first substrate;
• irradiating a laser toward areas of the light emitting elements from a surface side opposite to the first metal layer on the first substrate to peel off the first substrate;
• and
• forming a second electrode on at least a portion of a surface exposed by peeling off the laminated film.