Heat treatment apparatus

A heat treatment apparatus comprising:

• a pair of parallel plate electrodes;
• a high-frequency power supply that applies a high-frequency voltage to the pair of parallel plate electrodes so as to discharge between the pair of parallel plate electrodes;
• a temperature measurement instrument that measures the temperature of a sample to be heated which is disposed in the pair of parallel plate electrodes;
• a gas introduction unit that introduces a gas into the pair of parallel plate electrodes;
• reflection mirrors that surround the pair of parallel plate electrodes;
• and
• a control unit that controls the output of the high-frequency power supply, wherein
• the control unit references the temperature measured by the temperature measurement instrument, and controls the output of the high-frequency power supply so as to control the heat-treatment temperature for the sample to be heated.

A heat treatment apparatus comprising:

• a high-frequency power supply;
• a lower electrode on which a sample to be heated is placed;
• an upper electrode to which the high-frequency power supply is connected and which is located at a position opposite to the position of the lower electrode;
• a gas introduction unit that introduces a gas, from which plasma is produced, into the gap between the upper electrode and lower electrode;
• and
• upper and lower reflection mirrors that cover the upper and lower electrodes via a space.