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US 2012/0006788 A1Published application
Chemical amplification resist composition, and mold preparation method and resist film using the same
AssigneeFUJIFILM Corporation
InventorsToru Fujimori, Koji Shirakawa, Toshihiro USA, Kenji Sugiyama, Takayuki Ito, Hideaki Tsubaki, Katsuhiro Nishimaki, Shuji Hirano, Hidenori Takahashi
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Abstract
A chemical amplification resist composition that is used for preparation of a mold, and a mold preparation method and a resist film each using the composition are provided.
Claims17
A chemical amplification resist composition that is used for preparation of a mold.
Dependencies are inferred from the claim text.