High-resolution microscopy and photolithography devices using focusing micromirrors
AssigneeEcole Polytechnique Federale De Lausanne (Epfl)
InventorsBastien Rachet, Fabrice Merenda, René Salathe
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Abstract
The invention relates to large-field high-resolution microscopy and photolithography setups operating with polychromatic light. It includes the use of a plurality of focusing micromirrors.
Claims18
High-resolution microscopy device comprising a light source, a sample area (9), a plurality of focusing micromirrors (2) and a plurality of detector elements (4) wherein said sample area (9) is located in the focus area of said micromirrors and wherein each focusing micromirror is adapted to collect and direct a sample information towards said detector elements (4).
High-resolution photolithography device comprising a light source, a sample area (34), a plurality of focusing micromirrors (2), wherein said sample area (34) is located in the focus area of said micromirrors (2) and wherein each focusing micromirror is adapted to collect an illumination light (5) and focus it onto a sample (34) of photo-sensitive material.
Dependencies are inferred from the claim text.