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US 2011/0300485 A1Published application
Organic solvent development or multiple development pattern-forming method using electron beams or euv rays
AssigneeFUJIFILM Corporation
InventorsHideaki Tsubaki, Koji Shirakawa, Toru Tsuchihashi
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Abstract
Provided is a pattern-forming method including, in the following order: (1) a process of forming a film with an actinic ray-sensitive or radiation-sensitive resin composition comprising a resin which contains an acid-decomposable repeating unit and is capable of decreasing the solubility in an organic solvent by the action of an acid; (2) a process of exposing the film with an electron beam or an EUV ray; and (4) a process of developing the film with a developer containing an organic solvent.
Claims15
A pattern-forming method comprising, in the following order:
- (1) a process of forming a film with an actinic ray-sensitive or radiation-sensitive resin composition comprising a resin which contains an acid-decomposable repeating unit and is capable of decreasing the solubility in an organic solvent by the action of an acid;
- (2) a process of exposing the film with an electron beam or an EUV ray;
- and
- (4) a process of developing the film with a developer containing an organic solvent.
1 more element
Dependencies are inferred from the claim text.