Plasma film deposition method
AssigneeHonda Motor Co., Ltd.
InventorShunichi YOROZUYA
Life of this patent
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Abstract
A plasma nozzle supplies a plasmatized electric discharge gas, and a first supply section in a flow regulator which is interposed between the plasma nozzle and a base member supplies a first liquid-phase raw material. A second supply section which is separate from the first supply section supplies a second liquid-phase raw material. The first liquid-phase raw material which is activated by a plasmatized electric discharge gas and deposited on the base member while in a liquid phase is caused to interact with the second liquid-phase raw material which is activated by the plasmatized electric discharge gas, and solidified into a film on the base member.
Claims8
A plasma film deposition method for depositing a film on a surface of a base member by causing a first liquid-phase raw material and a second liquid-phase raw material, which are activated by a plasma, to interact with each other and solidify the first liquid-phase raw material, comprising the steps of:
- supplying a plasmatized electric discharge gas from a plasma nozzle and supplying the first liquid-phase raw material from a first supply section in a flow regulator which is interposed between the plasma nozzle and the base member;
- supplying the second liquid-phase raw material from a second supply section which is separate from the first supply section;
- and
- forming a film on the base member by causing the first liquid-phase raw material which is activated by the plasmatized electric discharge gas and deposited on the base member while in a liquid phase, to interact with the second liquid-phase raw material which is activated by the plasmatized electric discharge gas.
Dependencies are inferred from the claim text.