Flat panel display device and method of manufacturing the same

A method of manufacturing a flat panel display device, the method comprising:

• forming a semiconductor layer of a thin film transistor (TFT) on a substrate;
• forming a gate electrode on the semiconductor layer with a gate insulating layer between the gate electrode and the semiconductor layer, and doping source and drain regions of the semiconductor layer with ion impurities;
• sequentially forming a first conductive layer, a first insulating layer, and a second conductive layer, and forming a capacitor at a distance away from the TFT by patterning the first conductive layer, the first insulating layer, and the second conductive layer;
• forming a second insulating layer, and forming contact holes passing through the second insulating layer, the contact holes exposing portions of the source and drain regions and the second conductive layer;
• and
• forming source and drain electrodes, the source electrode contacting the source region and the drain electrode contacting the drain region, one of the source electrode and drain electrode contacting the second conductive layer through the contact holes.