Apparatus and method for batch non-contact material characterization
AssigneeVeeco Instruments Inc.
InventorsDong Seung Lee, Mikhail Belousov, Eric A. Armour, William E. Quinn
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Abstract
An apparatus for performing non-contact material characterization includes a wafer carrier adapted to hold a plurality of substrates and a material characterization device, such as a device for performing photoluminescence spectroscopy. The apparatus is adapted to perform non-contact material characterization on at least a portion of the wafer carrier, including the substrates disposed thereon.
Claims19
An apparatus for performing non-contact material characterization on substrates, comprising:
- (a) an epitaxial growth apparatus having a processing chamber for depositing a material on at least one substrate held on a wafer carrier, said epitaxial growth apparatus having an ancillary chamber in communication with said processing chamber and configured to receive said wafer carrier;
- and
- (b) a non-contact material characterization device for evaluating the positioning of the at least one substrate held on said wafer carrier while said wafer carrier is disposed in said ancillary chamber.
A method for performing non-contact material characterization on substrates, comprising the steps of:
- (a) positioning a wafer carrier in an ancillary chamber of an epitaxial growth apparatus, the wafer carrier holding at least one substrate thereon;
- and
- (b) evaluating positioning of the at least one substrate held on the wafer carrier while the wafer carrier is disposed in the ancillary chamber.
Dependencies are inferred from the claim text.