Substrate processing method, and program storage medium therefor

A substrate processing method for drying a substrate, by using a fluid heated by a heating apparatus including an inlet, an outlet, and a plurality of heating mechanisms for heating the fluid flowing from the inlet to the outlet, the method comprising the steps of:

• placing a substrate in a processing chamber;
• and
• supplying a gas and a processing liquid, into the heating apparatus, from the inlet, heating a mixed fluid containing the gas and the processing liquid, in the heating apparatus, as well as supplying the heated mixed fluid discharged from the outlet of the heating apparatus, into the processing chamber in which the substrate is placed,
• wherein, in the step of supplying the mixed fluid into the processing chamber, an output of one of the plurality of heating mechanisms located nearest to the inlet of the heating apparatus is kept at a preset constant value for a period of time during which a predetermined time passes after the start of supplying the processing liquid into the heating apparatus, while an output of one of the plurality of heating mechanisms located nearest to the outlet is determined, under a feed back control, in order to set the temperature of the mixed fluid, during or after the heating process, at a preset value.